PRODUCTS
Etch Depth Monitor
Benefits
The LEP400 enables plasma etch users to decrease process development time & manufacturing costs AND increase yield & product performance through...
Real time, in-situ measurement and control. Unlike other techniques,
you can monitor the etch as it proceeds through a bulk layer...you
don't need material interfaces or an etch stop layer! |
 |
|||||||
 |
||||||||
|
Predictive modelling software – reduce material waste &
process development time |
||||||||
 |
||||||||
|
Data reprocessing to decrease process optimisation time. An ideal
tool to seamlessly progress from R&D to full volume manufacturing. |
||||||||
 |
||||||||
|
User friendly EtchDirector© software
in a Windows® environment – fast and intuitive interface
puts you in control. All the tools you require in one easy to use
integrated package. |
||||||||
 |
||||||||
|
Integration to etch tool for automated operation. Powerful DIGIO client
gives you clear access to the systems IO features. |
||||||||
  |
||||||||
|
Fast data acquisition and high noise rejection for accurate termination |
||||||||
 |
||||||||
|
Remote control for through-wall cleanroom implementation |
||||||||
Copyright
© Intellevation
Ltd 2006