The
EtchDirector Software Suite

The
LEP400 Base Systems are all supplied with Intellemetrics' powerful
EtchDirector software suite preinstalled and ready for your use. The
following gives a brief outline of its capabilities.
The full EtchDirector screen will look something like this....
There
are five user selectable windows allowing display of the parameters
you want to see. These
include;
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Live
graphing in "chart" and "moving chart" formats.
Material
Library
Wafer
Structure
Modelled
Data
End
Point Parameters
Data
Logging
Live
Camera Image (option)
Reprocessing
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| Also there is a Control
Panel to allow you to manually control the system via push buttons
and instantly see the operating state of the system. |

Modelling
The first thing you want to know is 'What will the signal as a function
of etch depth look like for my wafer?". Therefore EtchDirector includes
a full modelling capability.
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Material Library
EtchDirector
includes a set of extensive libraries of materials with n
and k values.
Each
library operates at a different wavelength, depending upon
the monitoring wavelength of the system you are using. For
example, the standard 670nm library comes with over 250 materials
preinstalled.
Each
library is editable so you can change values and add or delete
as many materials materials as required.
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Structure Window
User
friendly interface to enter the wafer details such as material
and thickness.
Double
click on a library entry to enter the n and k values.
Rapidly
enter multiple quantum well structures and colour code them
for easy viewing.
Cut
and paste functions to speed entry.
Select
Thickness Units from Angstroms to nm to microns.
Save
Structure File for later use.
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Model Window
From
the Structure Window simply press the Create Model button.
Shows
the Reflectance versus Etch Depth.
Shows
turning points.
Select
axis units (Angstroms, nm or microns)
Full
range of zooming capabilities.
Save
data to a range of formats (Intellemetrics' own .mod format,
CSV, bitmap or copy to clipboard)
The model shows you the signal variations you
should expect to see during the etch process.
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End Point Detection
The EtchDirector software enables you to create a wide range of
endpoint conditions to track the etch depth and etch
rate, and to automatically stop at the desired end point. The end
point algorithms can be tailored to satisfy a wide range of processes.
The various modes available include.....
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Simplex Mode
This is the simplest mode and is ideal for
etching of bulk layers, or single layers on a substrate.
The user simply enters the refractive index of the layer
being etched and the desired end etch depth. The system monitors
the etch, tracks the etch depth and etch rate and stops the
system at the end point.
Filtering, Hold Off, and Overetch conditions
can all be entered.
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Model Mode
In Model Mode the user loads a previously modelled
structure file and enters the desired etch depth. The system
then tracks the live signal and uses advanced algorithms
to determine the instantaneous etch depth. The system will
create an end point condition when it reaches the desired
etch depth.
Filtering, Hold Off, and Overetch conditions
can all be entered.
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Kink Mode
Kink Mode is a powerful algorithm that can
either detect the 'flat' line' at the end of an etch process
(such as etching resist on quartz) or it can be used to detect
the interface between different absorbing materials such
as various metal layers.
One of its biggest advantages is that you don;t
need to know the starting thickness of the material you are
etching....its will detect the interface anyway.
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Live Monitoring
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During the etch process EtchDirector shows
whatever views you want to see. These can include a live
chart of the varying reflectance as a function of time, the
theoretical reflectance as a function of etch depth, the
live camera image, etc. During the run the system can be
configured for manual operation (ideal for R&D labs where
an operator is present to stop the etch process at the desired
point) or in an automatic way if the system is connected
to the control system via the digital IO option.
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The Control
Panel
The Control Panel is a fixed element within
the EtchDirector environment. It shows you the present state
of the system, allows full manual operation, shows the state
of automatic operation and shows other important parameters.
The
Signal Level shows a live reflectance level meter and is
especially useful during alignment.
Manual
buttons enable full manual control, such as START, GO, HOLD,
CONTINUE and FORCE CUT.
Status
LEDS show the state of the digital IO signals being sent
and recieved.
The
present etch time, the etch rate and the etch depth are shown
in the units of your choice.
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Data Logging
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Automatic
data logging of each run. Saves the RAW data, filter setting
and end point parameters.
User
specifies Folders and filename formats.
Includes
run number, sequence number and date/time stamping.
Automatic
data logging of all Control Panel status changes.

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Interface Options for Automatic
Control
The LEP400 Base System with the Digi IO option can be integrated
into the control system of an etch machine to enable full automatic
control of the etch process.


Connection
via 50 way SCSI connector or screw terminal block
5V
to 24V opto-isolated ports
Fully
configurable via DIGIO Client software within EtchDirector
Establishes
the following virtual status outputs
Idling / WaitingForGo / Etching / OverEtching / InterCutting
/ Cutting / Holding
Establishes
the following input command inputs
Start / Go / ForceCut / Hold / Continue
Runs
as a free standing executable with its own GUI which simplifies setting
up of the digital IO
Provides
push buttons to override inputs and outputs
Provides
LEDs to show status of inputs and outputs
Provides
a log to record in/out activity
The
physical characteristics of the ports can be edited on
a port by port basis.
direction …input or output (if supported
by card)
sense… inverted or normal
edge or level triggered if an input
pulse or fixed if an output
qualification period presetable for inputs
pulse period presetable for outputs
 Contact
us today for a quote...
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